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647543

Silicon

Name: Silicon
Brand: ALDRICH

wafer (single side polished), <111>, N-type, contains no dopant, diam. × thickness 3 in. × 0.5 mm

Synonym(s):

Silicon element

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About This Item

Linear Formula:

CAS Number:

7440-21-3

Molecular Weight:

28.09

NACRES:

NA.23

PubChem Substance ID:

24883544

UNSPSC Code:

12352300

EC Number:

231-130-8

MDL number:

MFCD00085311

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Properties

Quality Level

100

form

crystalline (cubic (a = 5.4037)), wafer (single side polished)

does not contain

dopant

greener alternative product characteristics

Design for Energy Efficiency
Learn more about the Principles of Green Chemistry.

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diam. × thickness

3 in. × 0.5 mm

bp

2355 °C (lit.)

mp

1410 °C (lit.)

density

2.33 g/mL at 25 °C (lit.)

greener alternative category

Enabling

semiconductor properties

<111>, N-type

SMILES string

[Si]

InChI

1S/Si

InChI key

XUIMIQQOPSSXEZ-UHFFFAOYSA-N

Description

General description

0 vortex defects. Etch pitch density (EPD) < 100 (cm^-2). Resistivity >1,000 Ω•cm

Oxygen content: ≤ 1~1.8 x 10¹⁸ /cm³; Carbon content: ≤ 5 x 10¹⁶ /cm³; Boule diameter: 1~8 ″

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flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)

Storage Class

11 - Combustible Solids

wgk

nwg

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

Substances Subject to be Indicated Names

ishl_indicated

Substances Subject to be Notified Names

ishl_notified

647543-1EA: + 647543-5EA: + 647543-VAR: + 647543-BULK:

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Certificates of Analysis (COA)

Lot/Batch Number

03003CD

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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

ネガ型フォトレジストキットの取り扱い方法

本フォトレジストキットには、リソグラフィープロセスにおける各ステップで必要な材料が含まれています。各材料は、すぐにお使いいただけるようにあらかじめ計量されており、エッチング液については、様々な基板に適切なものをお選びいただけるように、個別に販売しています。

Articles

シリコン表面上の単分子膜

シリコン表面上の分子単分子膜の方法、その特性、分子エレクトロニクスやセンシングへの応用を探る。

一置換および二置換アルコキシシロキサンを使用した融解ゲルの合成

一置換および二置換アルコキシシロキサンから合成された融解ゲルは、生物医学、電子工学、光電子工学などへの応用が期待されています。

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.

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