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About This Item
vapor density
3.7 (vs air)
Quality Level
vapor pressure
1.08 mmHg ( 100 °C)
description
anti-fade reagent
assay
≥99%
form
sublimed
bp
267 °C (lit.)
mp
138-143 °C (lit.)
SMILES string
Nc1ccc(N)cc1
InChI
1S/C6H8N2/c7-5-1-2-6(8)4-3-5/h1-4H,7-8H2
InChI key
CBCKQZAAMUWICA-UHFFFAOYSA-N
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signalword
Danger
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Skin Sens. 1 - STOT SE 1 Oral
target_organs
Kidney,Heart,Musculo-skeletal system
Storage Class
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk
WGK 3
flash_point_f
230.0 °F - closed cup
flash_point_c
110 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type P2 (EN 143) respirator cartridges
Regulatory Listings
Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.
Class I Designated Chemical Substances
prtr
Substances Subject to be Indicated Names
ishl_indicated
Substances Subject to be Notified Names
ishl_notified
695106-5G:4.548173288178E12 + 695106-1G:4.548173288161E12
jan
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Articles
原子層堆積法は、半導体デバイスの微細化やナノ粒子のコーティングなど、さまざまなニーズに対応しています。
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.


