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About This Item
vapor density
7.2 (vs air)
Quality Level
vapor pressure
<1 mmHg ( 20 °C)
assay
≥99.5% (GC)
form
liquid
refractive index
n20/D 1.382 (lit.)
bp
168 °C (lit.)
density
0.933 g/mL at 20 °C (lit.)
SMILES string
CCO[Si](OCC)(OCC)OCC
InChI
1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
InChI key
BOTDANWDWHJENH-UHFFFAOYSA-N
Application
- Si oxide
- Oxycarbide
- Doped silicate
- Silanol
- Siloxane polymer
- Organosilicon thin films
The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
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signalword
Warning
hcodes
Hazard Classifications
Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
target_organs
Respiratory system
Storage Class
3 - Flammable liquids
wgk
WGK 1
flash_point_f
113.0 °F - closed cup
flash_point_c
45 °C - closed cup
Regulatory Listings
Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.
Group 4: Flammable liquids + Type 2 petroleums + Hazardous rank III + Water insoluble liquid
fsl
Substances Subject to be Indicated Names
ishl_indicated
Substances Subject to be Notified Names
ishl_notified
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