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216011

Ammonium fluoride

ACS reagent, ≥98.0%

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About This Item

Linear Formula:
NH4F
CAS Number:
12125-01-8
Molecular Weight:
37.04
PubChem Substance ID:
329752182
eCl@ss:
38050106
UNSPSC Code:
12352300
NACRES:
NA.21
EC Number:
235-185-9
MDL number:
MFCD00011423
Assay:
≥98.0%
Grade:
ACS reagent
Form:
crystals, granules or chunks
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grade

ACS reagent

Quality Level

200

assay

≥98.0%

form

crystals, granules or chunks

impurities

≤0.005% insolubles

ign. residue

≤0.01%

pH

~6 (20 °C)

anion traces

chloride (Cl-): ≤0.001%, sulfate (SO42-): ≤0.005%

cation traces

Fe: ≤5 ppm, heavy metals (as Pb): ≤5 ppm

SMILES string

N.F

InChI

1S/FH.H3N/h1H;1H3

InChI key

LDDQLRUQCUTJBB-UHFFFAOYSA-N

Application

Employed in a new hydrothermal synthesis of complex flourides NaHoF4 and NaEuF4 these interesting compounds have the fluorite structure and are important for solid-state lasers as well as for photoluminescence and magnetic characteristics.

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pictograms

Skull and crossbones
GHS06

signalword

Danger

Hazard Classifications

Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral

Storage Class

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

wgk

WGK 1

flash_point_f

does not flash

flash_point_c

does not flash

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

Deleterious substance

pdsc

Class I Designated Chemical Substances

prtr

Substances Subject to be Indicated Names

ishl_indicated

Substances Subject to be Notified Names

ishl_notified

216011-500G:4.548173931814E12 + 216011-100G:4.548173931807E12

jan

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Self-organized TiO2 nanotubes prepared in ammonium fluoride containing acetic acid electrolytes.
Tsuchiya H, et al.
Electrochemical Communications, 7(6), 576-580 (2005)
Phase transition in ammonium fluoride.
Stevenson R.
J. Chem. Phys. , 34(1), 346-347 (1961)
On the Etching of Silicon by Oxidants in Ammonium Fluoride Solutions A Mechanistic Study.
Gerischer H and Lubke M.
Journal of the Electrochemical Society, 135(11), 2782-2786 (1988)
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