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759562

Tris(dimethylamino)silane

packaged for use in deposition systems

Synonym(s):

Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS

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About This Item

Linear Formula:
((CH3)2N)3SiH
CAS Number:
15112-89-7
Molecular Weight:
161.32
NACRES:
NA.23
PubChem Substance ID:
329766793
UNSPSC Code:
12352103
EC Number:
239-165-0
MDL number:
MFCD00048006
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Quality Segment

100

assay

≥99.9% (GC)

form

liquid

bp

142 °C (lit.)

mp

−90 °C (lit.)

density

0.838 g/mL at 25 °C (lit.)

SMILES string

CN(C)[SiH](N(C)C)N(C)C

InChI

1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3

InChI key

TWVSWDVJBJKDAA-UHFFFAOYSA-N

General description

Tris(dimethylamino)silane is an organosilicon compound with high volatility and thermal stability, widely used as a vapor deposition precursor to fabricate silicon-containing thin films for various applications, including solar cells, fuel cell catalysts, and semiconductors. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range, thus making it a very good vapor deposition precursor.

Application

Tris(dimethylamino)silane can be used:
  • As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
  • As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.

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Danger

supp_hazards

EUH029

Storage Class

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk

WGK 3

flash_point_f

16.0 - 32.0 °F - closed cup

flash_point_c

-8.89 - 0.00 °C - closed cup

Hazard Classifications

Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react. 2

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