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759414

Tetraethyl orthosilicate

packaged for use in deposition systems

Synonym(s):

Tetraethyl orthosilicate, Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate, TEOS

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About This Item

Linear Formula:
Si(OC2H5)4
CAS Number:
78-10-4
Molecular Weight:
208.33
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
329766783
EC Number:
201-083-8
Beilstein/REAXYS Number:
1422225
MDL number:
MFCD00009062
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vapor density

7.2 (vs air)

Quality Level

100

vapor pressure

<1 mmHg ( 20 °C)

assay

≥99.5% (GC)

form

liquid

refractive index

n20/D 1.382 (lit.)

bp

168 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

SMILES string

CCO[Si](OCC)(OCC)OCC

InChI

1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3

InChI key

BOTDANWDWHJENH-UHFFFAOYSA-N

Application

Commonly used as a precursor to prepare xerogel
Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:
  • Si oxide
  • Oxycarbide
  • Doped silicate
  • Silanol
  • Siloxane polymer
  • Organosilicon thin films

The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
Will interact with dodecylamine in the formation of intercalation compounds of H+-magadiite and used in a study of mixed-metal bioactive glasses.

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pictograms

FlameExclamation mark
GHS02,GHS07

signalword

Warning

Hazard Classifications

Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk

WGK 1

flash_point_f

113.0 °F - closed cup

flash_point_c

45 °C - closed cup

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